Development of radio frequency plasma enhanced chemical vapor deposition system

Abstract

In this research, Inductively Coupled Planar Coil Frequency Plasma Enhanced Chemical Vapor Deposition (RF-PECVD) system has been developed and setup. RF-PECVD system is of interest since it dose not require electrode to generate plasma resulting in better film quality growth. RF-PECVD system operate at pressure between 10-3 - 30 torr. RF generator is operated at 13.56 MHz. In order to increase the power dissipation into the glow discharge, the energy from RF generator transfer utilizing the impedance matching network. When electrons and gas molecules in the reactor chamber are expored to the energy, they accelate and collide. Initailly plasma is generated then thin-film coating occurred. Characteristics of the system are studied, A Rogowski coil and high voltage capacitive probe were used to measure the current and the voltage of the planar coil respectively. Polyacetylene thin-film coating is advantage of development of RF-PECVD system. Polyacetylene thin-film are prepared from monomer vapor of acetylene. Thin films obtained in this work, are investigated using Infrared (IR) Spectroscopy and Nuclear Magnetic Resonance Spectroscopy (NMR).